技术指标:Wafer size: 2inch,4inch,6inch and un-normal small wafers Exposure mode:(Vac, hard, soft, proximity) Minimum line width:0.7μm(Vac) Overlay Accuracy: 0.5μm
仪器用途:用于实验室研发,小批量生产的高分辨率光刻系统
收费标准:800元/小时,超净费用另付
机组负责人:张嫔 62872625 pzhang2008@sinano.ac.cn